Obvious ferroelectricity in undoped HfO2 films by chemical solution deposition

Published: 14/01/2020
Obvious ferroelectricity in undoped HfO2 films by chemical solution deposition
Source: PUBS.RSC.ORG

J. Mater. Chem. C , 2020, Accepted Manuscript DOI : 10.1039/C9TC06400A, Paper Haiyan Chen, Yonghong Chen, Lin Tang, Hang Luo, Kechao Zhou, Xi Yuan, Dou Zhang Although great achievements have been made in ferroelectricity of HfO2-based films by ALD method, the performance is strongly constrained by film thickness and dopant types. This work was the first... The content of this RSS Feed (c) The Roya

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